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  3. Engineering Management Review
  4. Erratum to “Additional Nitrogen Ion-Implantation Treatment in STI to Relax the Intrinsic Compressive Stress for n-MOSFETs”
Details
Category: Engineering Management Review
By MTech Projects
MTech Projects
15.May
Hits: 56

Erratum to “Additional Nitrogen Ion-Implantation Treatment in STI to Relax the Intrinsic Compressive Stress for n-MOSFETs”

PROJECT TITLE :

Erratum to “Additional Nitrogen Ion-Implantation Treatment in STI to Relax the Intrinsic Compressive Stress for n-MOSFETs”

ABSTRACT:

In our original work [1], we demonstrated the usage of N-IMP in STI SiO2 to relax the compressive stress within the n-MOSFETs and more improve the core device performance accordingly.

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